1.1 This test method covers a procedure for measuring the strain gradient in thin, reflecting films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric microscope. Measurements from cantilevers that are touching the underlying layer are not accepted.
Product Details
- Published:
- 05/01/2018
- Number of Pages:
- 21
- File Size:
- 1 file , 600 KB
