1.1 This specification covers sputtering targets fabricated from metallic silicides (molybdenum silicide, tantalum silicide, titanium silicide, and tungsten silicide). These targets are referred to as refractory silicide targets, and are intended for use in microelectronic applications.
1.2 The values stated in SI units are regarded as standard.
Product Details
- Published:
- 12/10/1999
- Number of Pages:
- 2
- File Size:
- 1 file , 27 KB
